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The ICP (Inductively Coupled Plasma) etching process in LED chip manufacturing is called Inductively Coupled Plasma etch

HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD
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    Buy cheap The ICP (Inductively Coupled Plasma) etching process in LED chip manufacturing is called Inductively Coupled Plasma etch from wholesalers
     
    Buy cheap The ICP (Inductively Coupled Plasma) etching process in LED chip manufacturing is called Inductively Coupled Plasma etch from wholesalers
    • Buy cheap The ICP (Inductively Coupled Plasma) etching process in LED chip manufacturing is called Inductively Coupled Plasma etch from wholesalers
    • Buy cheap The ICP (Inductively Coupled Plasma) etching process in LED chip manufacturing is called Inductively Coupled Plasma etch from wholesalers
    • Buy cheap The ICP (Inductively Coupled Plasma) etching process in LED chip manufacturing is called Inductively Coupled Plasma etch from wholesalers
    • Buy cheap The ICP (Inductively Coupled Plasma) etching process in LED chip manufacturing is called Inductively Coupled Plasma etch from wholesalers

    The ICP (Inductively Coupled Plasma) etching process in LED chip manufacturing is called Inductively Coupled Plasma etch

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    Brand Name : ZG
    Model Number : MS
    Certification : CE
    Price : USD10/piece
    Payment Terms : L/C, D/A, D/P, T/T, Western Union, MoneyGram
    Supply Ability : 10000 pieces per month
    Delivery Time : 3 working days
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    The ICP (Inductively Coupled Plasma) etching process in LED chip manufacturing is called Inductively Coupled Plasma etch

    SiC ICP Tray



    Silicon carbide ICP tray is formed by isostatic pressing process and sintering at high temperature. The outer diameter, thickness, number and size of acupoints, position and shape of the tablet groove can also be finished according to the requirements of the user's design drawings to meet the specific requirements of the user.

    Typical applications
    • The ICP (Inductively Coupled Plasma) etching process in LED chip manufacturing is called Inductively Coupled Plasma etching.
    Features and advantages
    • Good thermal conductivity, low coefficient of expansion and temperature uniformity
    • Plasma impact resistance
    • Can be made according to the specific size requirements of customers, the maximum diameter can reach 495MM
    • Resistant to all kinds of strong acid and alkali chemical reagent corrosion
    Specifications:Diameter 330/380mm
    Quality The ICP (Inductively Coupled Plasma) etching process in LED chip manufacturing is called Inductively Coupled Plasma etch for sale
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