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Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems

HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD
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    Buy cheap Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems from wholesalers
     
    Buy cheap Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems from wholesalers
    • Buy cheap Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems from wholesalers
    • Buy cheap Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems from wholesalers
    • Buy cheap Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems from wholesalers
    • Buy cheap Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems from wholesalers
    • Buy cheap Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems from wholesalers
    • Buy cheap Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems from wholesalers

    Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems

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    Brand Name : ZG
    Model Number : MS
    Certification : CE
    Price : USD10/piece
    Payment Terms : L/C, D/A, D/P, T/T, Western Union, MoneyGram
    Supply Ability : 10000 pieces per month
    Delivery Time : 3 working days
    • Product Details
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    Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems


    Sputter Target for Pulsed Laser Deposition ( PLD ) systems and DC or RF Magnetron Sputtering Systems


    We provides a wide range of sputter target including Metal , Alloy , Rare earth , Single crystal , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and DC or RF Magnetron Sputtering Systems , These targets can be fabricated to fit all sputtering systems including round , rectangular , S-Gun , Delta , and Ring . Sputter target can be fabricated in round or square shape , with back plate or without back plate depands on the sputtering system and target material you have , our standard size from 1" to 12 " in diameter , thickness range from 1 mm , 3 mm to 6 mm , in single or multiple-piece construction . In addition , we can offer custom specifications designed to your unique needs including , dimension , thickness , purity , density , uniform grain size , composition rate , and different back plate . We have various sputter targets in stock and can machine to your specification with good quality . Contact us for more information .

    Manufacture MethodApplication field
    Vacuum hot pressingSemiconductor
    Hot isostatic pressingData storage
    Cold isostatic pressingOptoelectronics
    Vacuum sinteringFlat panel display
    Vacuum arc meltingSolar cell

    Product Specification


    Purity99.9% / 99.99% / 99.999%
    DiameterØ 1" / Ø 2" / Ø 3" / Ø 4"/ Ø 6" / Ø 8"
    Thickness3 mm ~ 6 mm
    Back plateOFHC copper
    BondingIndium / Ag epoxy
    PackageVacuum sealed

    1. Boride Sputter Target

    CrB, FeB, HfB2, LaB6, MgB2, Mo2B5 ,NbB, SmB6, TaB, TiB2, WB, VB, VB2, ZrB2


    2. Carbide Sputter Target

    B4C, Cr3C2, HfC, Mo2C, NbC, SiC, TaC, TiC, TiCN, VC, WC, VC, ZrC


    3. Fluoride Sputter Target

    BaF2, CaF2, CeF3, FeF2, KF, LaF3, PbF2, MgF2, NaF


    4. Nitride Sputter Target

    AlN, BN, CrN, GaN, HfN, InN, NbN, NbCrN, Si3N4, TaN, TiN, VN, ZnN, ZrN, ZrCN


    5. Oxide Sputter Target

    Al2O3, ATO, AZO, BaTiO3, BSCCO, BST, CeO2, CuO, Cr2O3,Fe2O3, HfO2, In2O3, ITO, IZO, IZGO, IZTO, LaAl2O3, LaSrMnO3, LiNbO3, MgO, MoO3, NiO, Nb2O5, PbTiO3, PZT, Sb2O3, SiO, SiO2, SnO2, SrRuO3, SrTiO3, Ta2O5, TiO2, SnO2, V2O5, WO3, Y2O3, Yb2O3, YBCO, YSZ, ZnO, ZAO, ZGO, ZIO, ZTO


    6. Selenide Sputter Target

    Al2Se3, Bi2Se3, CdSe, CuSe, Cu2Se, FeSe2, GeSe, In2Se3, MoSe2, MnSe, NbSe2, PbSe, Sb2Se3, SnSe, TaSe2, WSe2, ZnSe


    7. Silicide Sputter Target

    CoSi2, CrSi2, FeSi2, HfSi2, MoSi2, NbSi2, NiSi2, TaSi2, TiSi2, WSi2, VSi2, ZrSi2


    8. Sulphide Sputter Target

    CdS, CuS, Cu2S, FeS2, GaS, GeS, In2S3, PbS, MoS2, NiS, TiS2, Sb2S3, SnS, WS2, ZnS


    9. Telluride Sputter Target

    Al2Te3, Bi2Te3, CdTe, CuTe, GaTe, Ga2Te3, GeTe, PbTe, MnTe, MoTe2, NbTe2, TaTe2, SbTe, SnTe, WTe2, ZnTe


    Quality Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems for sale
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